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  • Ion Implantation Parts
  • Ion Implantation Parts

Ion Implantation Parts

We always adhere to the quality basis of self-produced refractory metal materials such as tungsten, molybdenum, tantalum and niobium, and have a complete set of high-precision material machining equipment such as EDM machines, grinding machines, milling machines and machining centers, and high-precision detection instruments such as video measuring instrument, height measuring device, roughness measuring instrument and three coordinate measuring machine.

Product Description


產(chǎn)品用途:

用來(lái)生產(chǎn)半導(dǎo)體離子注入零件。

Application:

They are used to produce parts of the semiconductor ion implanter.

 

產(chǎn)品性能參數(shù)/Product Property Parameters

產(chǎn)品名稱(chēng)Name

W

Mo

TZM

密度Density

(g/cm3)

19.1

10.15

10.05

 

產(chǎn)品加工精度參數(shù)/Product Processing Accuracy Parameters

主要材質(zhì)

Main Materials

 

加工范圍

Processing

Range

 

尺寸精度Dimensional Accuracy (mm)

 

形狀精度Shape Accuracy (mm)

 

位置精度Position Accuracy (mm)

 

光潔度Finish

(Ra, μm)

WM、TZM

0.00-5.00

±0.003

0.01

0.005

0.2-0.4

WM、TZM

5.01-15.00

±0.005

0.015

0.006

0.4

W、M、TZM

15.01-30

±0.008

0.02

0.007

0.4

WM、TZM

30.01-100

±0.010

0.025

0.008

0.6

W、M、TZM

> 100

±0.0127

0.030

0.010

0.6


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